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"Parallel" Erwin Olaf

Hosted by the Consul of the Shanghai Exhibitions & Arts Group
Event Cover Photo
Took place 2 months ago
Thu 30 May 14:30 - 16:30

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Dutch photographer Erwin Olaf, one of the most important and influential photographers at work in the Netherlands today, is presenting nearly fifty photographs from his dynamic career. Those works are shown for the first time in China.

Olaf’s expertise lies in fashion photography and in creating provocative advertising campaigns. Beneath the veneer of glamor and perfection that has come to characterize Olaf’s style – in his own words the “highly stylized staged” aspect of his photography —“Parallel”seeks the deeper message that lies beneath the surface.

Are you curious to know what is the message beneath the surface?

30th May will be the last day of his exhibition in Shanghai. If you have time and interest, welcome to join me to explore his world.